Highly oriented and ordered microstructures in block copolymer films
نویسندگان
چکیده
منابع مشابه
Evolution of block copolymer lithography to highly ordered square arrays.
The manufacture of smaller, faster, more efficient microelectronic components is a major scientific and technological challenge, driven in part by a constant need for smaller lithographically defined features and patterns. Traditional self-assembling approaches based on block copolymer lithography spontaneously yield nanometer-sized hexagonal structures, but these features are not consistent wi...
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The (relative) energies of symmetric tilt grain boundaries in a strongly segregated lamellar block copolymer are determined by analysis of the dihedral angles at grain-boundary triple junctions. The analysis reveals two regimes: at low and intermediate misorientations (corresponding to a tilt-angle range 0≤θ≤85°) the grain-boundary energy is found to depend on the tilt angle as E(θ)∼θ(x), with ...
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ژورنال
عنوان ژورنال: Journal of Polymer Science Part B: Polymer Physics
سال: 2018
ISSN: 0887-6266,1099-0488
DOI: 10.1002/polb.24720